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Browsing by Author Jin, Hao

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Showing results 14 to 33 of 35

Hydrogen introduction by acid solution to Si/Si02 interface

Author(s)Zhang, Chun; Jin, Hao; Jellett, Wendy, et al
TypeConference paper
Date Published2008
Date CreatedSeptember 1-4 2008

Hydrogen Passivation of LPCVD Si3N4/SiO2/Si Stacks by Ammonia Plasma Treatment

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeJournal article
Date Published2007
Date Created-

Hydrogen reintroduction by forming gas annealing to LPCVD silicon nitride coated structures

Author(s)Jin, Hao; Weber, Klaus; Deenapanray, Prakash, et al
TypeJournal article
Date Published2006
Date Created-

Influence of boron diffusion on the Si Surface passivation

Author(s)Jellett, Wendy; Weber, Klaus; Jin, Hao
TypeConference paper
Date Published2007
Date CreatedSeptember 3-7 2007

Influence of Phosphorous Diffusion on the Si Surface Passivation

Author(s)Jin, Hao; Weber, Klaus; Jellett, Wendy, et al
TypeConference paper
Date Published2007
Date CreatedSeptember 3-7 2007

Introduction of atomic hydrogen into Si 3 N 4 /SiO 2 /Si stacks

Author(s)Jin, Hao; Weber, Klaus; Li, Wei, et al
TypeJournal article
Date Published2006
Date Created-

Introduction of Negative Charges in Nitride for PV Applications

Author(s)Jin, Hao; Weber, Klaus; Paudyal, Bijaya, et al
TypeConference paper
Date Published2009
Date CreatedJune 7-12 2009

Investigation of interface properties in oxide passivated boron diffused silicon

Author(s)Nursam, Natalita; Weber, Klaus; Jin, Hao, et al
TypeJournal article
Date Published2010
Date Created-

Low SI surface recombination through negatively charged Si3N4 films

Author(s)Jin, Hao; Weber, Klaus; Zhang, Chun, et al
TypeConference paper
Date Published2009
Date CreatedSeptember 21-24 2009

Passivation and depassivation of Si-SiO 2 interfaces with atomic hydrogen

Author(s)Zhang, Chun; Weber, Klaus; Jin, Hao
TypeJournal article
Date Published2009
Date Created-
01_Jin_Passivation_of_LPCVD_nitride_2006.pdf.jpg

Passivation of LPCVD nitride silicon stacks by atomic H

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedMay 8-12 2006
01_Jin_Plasma_ammonia_passivation_of_2006.pdf.jpg

Plasma ammonia passivation of SiN/SiO2/Si stacks

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedJune 25-30, 2006

Relationship between interface defect density and surface recombination velocity in (111) and (100) Silicon / Silicon Oxide structure

Author(s)Jin, Hao; Weber, Klaus
TypeConference paper
Date Published2008
Date CreatedSeptember 1-4 2008

Si-SiO2 interface passivation by plasma NH3 and atomic H

Author(s)Jin, Hao; Weber, Klaus; Jayaprasad, A, et al
TypeJournal article
Date Published2006
Date Created-
1AV_2_17.pdf.jpg

Silicon / Silicon oxide / LPCVD Silicon nitride stacks: The effect of oxide thickness on bulk damage and surface passivation

Author(s)Jin, Hao; Weber, K. J; Blakers, Andrew
TypeConference paper
Date Published-
Date Created2005

Silicon/silicon oxide/LPCVD silicon nitride stacks: the effect of oxide thicknoww on bulk damage and surface passivation

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2005
Date CreatedJune 6 2005

SLIVER Solar Cells

Author(s)Jin, Hao; Weber, Klaus; Deenapanray, Prakash, et al
TypeConference paper
Date Published2005
Date CreatedOctober 10 2005
01_Weber_Surface_passivation_using_2009.pdf.jpg

Surface passivation using dielectric films: How much charge is enough?

Author(s)Weber, Klaus; Jin, Hao; Zhang, Chun, et al
TypeConference paper
Date Published2009
Date CreatedSeptember 21-24 2009
01_Jin_The_effect_of_a_post_oxidation_2006.pdf.jpg

The effect of a post oxidation in-situ nitrogen anneal on Si surface passivation

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedMay 8-12 2006

The effect of exposure of Si-Si02 structure to atomic H by PECVD reactor

Author(s)Zhang, Chun; Weber, Klaus; Jin, Hao, et al
TypeConference paper
Date Published2009
Date CreatedJune 7-12 2009

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