Vu, KhuMadden, Steve2015-12-102015-12-10July 10-149781118273746http://hdl.handle.net/1885/69146We report the fabrication of Tellurium oxide films with deposited propagation losses that are sufficiently low to allow the fabrication of high quality planar integrated optical devices. Stoichiometric low loss films were produced by reactive magnetron RF sputtering and the effect of a wide range of sputtering parameters on stoichiometry, refractive index, Raman spectra and optical loss of thin films were investigated. As deposited TeO2 films with propagation losses below 0.1 dB/cm at 1550nm have been achieved which are therefore well suited for integrated optical applications.Keywords: High quality; Integrated optical devices; Integrated photonics; Optical applications; Propagation loss; Rf-sputtering; Sputtering parameters; Tellurium oxide; Tellurium oxide films; Integrated optics; Optical glass; Oxide films; Photonics; Refractive inde201210.1002/9781118472590.ch212016-02-24