Suh, Dong ChulYu, Jun XLiang, WenshengWeber, KlausChoi, Duk-Yong2015-12-13June 16-219781479932993http://hdl.handle.net/1885/82695A detailed study of the passivation quality of Al2O3 and TiO2 stacks on boron-doped emitters, where the stacks were deposited by thermal atomic layer deposition. The passivation quality was studied for different post-TiO2 anneal temperature, as a function201310.1109/PVSC.2013.67443812015-12-11