Brault, PascalJosserand, ChristopheBauchire, Jean-MarcCaillard, A.Charles, ChristineBoswell, Roderick2015-12-070031-9007http://hdl.handle.net/1885/17356Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.Keywords: Atomic physics; Atoms; Nonlinear equations; Porous materials; Anomalous diffusions; Atom depositions; Atomic diffusions; Diffusion equations; Diffusion profiles; Dynamic controls; Porous mediums; Porous substrates; Rescaling; Scaling analysis; Time-depend200910.1103/PhysRevLett.102.0459012016-02-24