Barbe, JeremyThomson, AndrewWang, Er-Chien (Eric)McIntosh, KeithCatchpole, Kylie2015-12-131062-7995http://hdl.handle.net/1885/70699We report the fabrication and characterization of TiO2 sol-gel diffraction gratings on silicon substrates by using nanoimprint lithography. The gratings are homogeneous and free of defects and cover an area of 25cm2. Minority carrier lifetimes of up to 900μs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light-generated negative charge in the films. The structures reported here are very promising as light-trapping, passivating coatings for solar cells.Keywords: Kelvin Probe measurements; Light-trapping; Minority carrier lifetimes; Nano-imprint; Negative charge; Silicon substrates; Solar-cell applications; TiO; Diffraction; Diffraction gratings; Passivation; Sol-gels; Solar cells; Titanium dioxide; Sol-gel proces diffraction grating; nanoimprint; passivation; solar cells; TiO 2 sol-gel; transient photoconductance decayNanoimprinted Tio 2 sol-gel passivating diffraction gratings for solar cell applications201210.1002/pip.11312016-02-24