Wong, Wah Chung2018-09-112018-09-112000b2054404http://hdl.handle.net/1885/147331x, 146 leavesen-AUTK7871.85.W65 2000SemiconductorsGermaniumSiliconIon implantationEpitaxyThe fabrication of SiGe/Si heterostructures by ion implantation and solid phase epitaxy200010.25911/5d627083c01232018-08-30