Madden, SteveWang, RongpingRode, Andrei VKrolikowska, MarylaLuther-Davies, BarryChoi, Duk-Yong2015-12-080022-3093http://hdl.handle.net/1885/33880We present evidence of nano-scale phase separation in amorphous arsenic tri-sulphide films prepared by ultra-fast pulsed laser deposition based on Raman spectroscopy, X-ray photo-electron spectroscopy, and atomic force microscopy. We also show the results from plasma etching this material and conclude that the grainy structure of etched surfaces comes from the differential chemical etch rates of the different phases.Keywords: Arsenic compounds; Atomic force microscopy; Chalcogenides; Phase separation; Plasma etching; Pulsed laser deposition; Raman spectroscopy; X ray photoelectron spectroscopy; Differential chemical etch; Grainy structure; Laser deposition; Thin films Chalcogenides; Laser deposition; Planar waveguides; Raman spectroscopy; UPS/XPSNano-phase separation of Arsenic Tri-sulphide (As 2 S 3 ) film and its effect on Plasma Etching200710.1016/j.jnoncrysol.2006.12.1022015-12-08