Au, Vicky2018-11-222018-11-222005b2278362http://hdl.handle.net/1885/151642xviii, 166 p.en-AUAuthor retains copyrightQC611.8.A5A9 2005SilicaAmorphous substancesThin filmsPlasma-enhanced chemical vapor depositionFilm stress in silicon dioxide deposited by helicon activated reactive evaporation200510.25911/5d515310b41442018-11-21