Process control of reactive sputter deposition of AlO x and improved surface passivation of crystalline silicon

Zhang, XinyuCuevas, AndresThomson, Andrew2015-12-102156-3381http://hdl.handle.net/1885/69866In this paper, we investigate the relationship between the deposition-process parameters of reactively sputtered aluminium oxide films and the passivation of silicon surfaces. A method of tuning the deposition process has been established that results inKeywords: Aluminium oxide; Crystalline silicons; Deposition pressures; Deposition process; Effective lifetime; Film characterizations; Low Power; Reactive sputter deposition; Silicon surfaces; Spectroscopy measurements; Sputtering target; Surface passivation; Surfa Photovoltaic cells; process control; silicon; sputtering; surfacesProcess control of reactive sputter deposition of AlO x and improved surface passivation of crystalline silicon201310.1109/JPHOTOV.2012.22147652016-02-24