Han, TingMadden, SteveLuther-Davies, BarryCharters, Robbie2015-12-101041-1135http://hdl.handle.net/1885/57228We describe the fabrication of single-mode polarization-insensitive polysiloxane channel waveguide gratings by a single-step ultraviolet nanoimprint lithography process with a polydimethylsiloxane stamp. A 10-dB deep grating response that matches the theoretically expected response at the first-order resonant wavelength was achieved in a 2-mm-long grating with no excess loss over the intrinsic material absorption. Features down to ∼100 nm could be replicated using the soft stamp.Keywords: Grating; Nano-imprint; polydimethylsiloxane (PDMS); Polysiloxanes; Soft lithography; Microchannels; Polarization; Silicones; Waveguides; Nanoimprint lithography Grating; nanoimprint lithography; polydimethylsiloxane (PDMS); polysiloxane; soft lithography; waveguides201010.1109/LPT.2010.20836452016-02-24