Submicrometer-Thick Low-Loss As 2 S 3 Planar Waveguides for Nonlinear Optical Devices

Madden, SteveBulla, DouglasWang, RongpingRode, Andrei VLuther-Davies, BarryChoi, Duk-Yong2015-12-101041-1135http://hdl.handle.net/1885/56747We describe a fabrication process for and the characterization of submicrometer-thick As2S3 waveguides. Poly(methylmethacrylate) and bottom antireflective coating were employed as thin protective layers prior to photoresist patterning in order to preventKeywords: Alkaline developer; Bottom antireflective coating; Etched sidewalls; Fabrication process; Low loss; Nonlinear optical devices; Photoresist patterning; Propagation loss; Protective layers; Submicrometers; Surface scattering; Transverse-magnetic mode; Amorp Amorphous semiconductors; Fabrication; Nonlinear optic devices; Optical waveguidesSubmicrometer-Thick Low-Loss As 2 S 3 Planar Waveguides for Nonlinear Optical Devices201010.1109/LPT.2010.20401702016-02-24