Frigg, AndreasBoes, AndreasRen, GuanghuiChoi, Duk-YongGees, SilvioMitchell, Arnan2023-09-28June 2-7 2978-194358058-3http://hdl.handle.net/1885/300291CMOS-compatible SiN layers with ultra-low roughness were deposited using plasma beam assisted reactive sputtering. Material losses below 0.1 dB/cm making it a promising deposition method for photonic integrated circuits and multilayer coatings.application/pdfen-AULow loss, plasma beam assisted reactive magnetron sputtered silicon nitride films for optical applications201910.1364/OIC.2019.WB.42022-08-07