Vora, KaushalKarouta, FouadJagadish, Chennupati2015-12-10August 27-9780819496669http://hdl.handle.net/1885/60872Nanostencil Lithography (NStL), while comparatively still in infant stages, is proving to be a viable option for low-cost and high resolution fabrication. An ideal stencil for NStL consists of a low-stressed silicon nitride membrane supported on a siliconAuthor/s retain copyright201310.1117/12.20226092015-12-10