Vora, KaushalShew, B.Y.Harvey, E.C.Hayes, J.P.Peele, Andrew Gareth2015-12-100960-1317http://hdl.handle.net/1885/61052We describe a model that predicts sidewall slope in SU-8 high aspect ratio microstructures made using x-ray lithography. Our experimental results are in accordance with our model and we demonstrate that essentially zero sidewall taper can be obtained under certain conditions. We use our results to explore the feasibility of optimizing a structure simultaneously for slope and surface roughness.Keywords: Aspect ratio; Mathematical models; Microstructure; Optimization; Surface roughness; Aspect ratio microstructures; X-ray lithography; Lithography200810.1088/0960-1317/18/3/0350372015-12-10