Deenapanray, Prakash N.K2018-10-032018-10-032000b2079228http://hdl.handle.net/1885/148050ix, 164 leavesen-AUTK7871.85.D44 2000SemiconductorsSilicon oxideSilicon nitrideSecondary ion mass spectrometryAtomic relocation processes in semiconductor materials200010.25911/5d63c422334ed2018-09-03