Canning, JAslund, MathiasAnkiewicz, AdrianDainese, MFernando, RSahu, JWosinski, L2015-12-130003-6935http://hdl.handle.net/1885/89257Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.Keywords: Stress anisotropy; Anisotropy; Compressive stress; Plasma enhanced chemical vapor deposition; Ultraviolet radiation; Birefringence20002015-12-12