Zakery, A.Ruan, YinlanRode, Andrei VSamoc, MarekLuther-Davies, Barry2015-12-130740-3224http://hdl.handle.net/1885/87697Ultrafast pulsed laser deposition was used to successfully deposit atomically smooth 5-μm-thick As2S3 films. The as-deposited films were photosensitive at wavelengths close to the band edge (∼520 nm), and waveguides could be directly patterned into theKeywords: Four wave mixing; Neodymium lasers; Photochromism; Photosensitivity; Pulsed laser deposition; Q switched lasers; Rapid thermal annealing; Refractive index; Thin films; Waveguides; Wavelength; Arsenic compoundsLow-loss Waveguides in Ultrafast Laser-deposited As<SUB>2</SUB>S<SUB>3</SUB> Chalcogenide Films20032015-12-12