Spooner, M GWalsh, T MElliman, Robert2015-12-132015-12-13April 21 21558997075http://hdl.handle.net/1885/86949Optical microcavity structures containing Si nanocrystals are fabricated by plasma enhanced chemical vapour deposition (PECVD) of SiO2 Si3N4 and SiOx layers. The nanocrystals are formed within Si-rich oxide layers (SiOx) by precipitation and growth, and the microcavity structures defined by two parallel distributed Bragg mirrors (DBM) made from either alternate SiO2/Si3N4 layers or alternate SiO2/SiOx layers. In the latter case, Si nanocrystal layers form part of the DBM structure thereby providing a distributed emission source. The optical emission from these and related structures are examined and compared with that from isolated nanocrystal layers.Keywords: Charge coupled devices; Diffraction gratings; Light reflection; Mirrors; Nanostructured materials; Photoluminescence; Plasma enhanced chemical vapor deposition; Precipitation (chemical); Refractive index; Semiconductor lasers; Solid state lasers; DistribuEffect of Microcavity Structures on the Photoluminescence of Silicon Nanocrystals20032015-12-12