Wei, Z. F.Xu, S. J.Duan, R. F.Li, Q.Wang, JianZeng, Y. P.Liu, H. C.2015-12-032015-12-030021-8979http://hdl.handle.net/1885/17001Variable-temperature photoluminescence(PL) spectra of Si-doped self-assembled InGaAsquantum dots(QDs) with and without GaAs cap layers were measured. Narrow and strong emission peak at 1075nm and broad and weak peak at 1310nm were observed for the buried and surfaceQDs at low temperature, respectively. As large as 210meV redshift of the PL peak of the surfaceQDs with respect to that of the buried QDs is mainly due to the change of the strain around QDs before and after growth of the GaAs cap layer. Using the developed localized-state luminescence model, we quantitatively calculate the temperature dependence of PL peaks and integrated intensities of the two samples. The results reveal that there exists a large difference in microscopic mechanisms of PL thermal quenching between two samples.The work was supported by HK RGC CERG Grant under Contract No. HKU 7049/04P and HKU Research Grant under Contract No. 10204008.http://www.sherpa.ac.uk/romeo/issn/0003-6951..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 3/12/15). Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics and may be found at https://doi.org/10.1063/1.2112176Thermal quenching of luminescence from buried and surface InGaAs self-assembled quantum dots with high sheet density2005-10-2010.1063/1.2112176