PRODUCTION OF POROUS STRUCTURES ON Si, Ge AND GaAs BY HIGH DOSE ION IMPLANTATION.

Williams, J. S.Chivers, D. J.Elliman, R. G.Johnson, S. T.Lawson, E. M.Mitchell, I. V.Orrman-Rossiter, K. G.Pogany, A. P.Short, K. T.2026-01-032026-01-0304440086910272-9172ORCID:/0000-0002-1304-4219/work/167651163https://hdl.handle.net/1885/7338034216enPRODUCTION OF POROUS STRUCTURES ON Si, Ge AND GaAs BY HIGH DOSE ION IMPLANTATION.19840021312579