Lakshmanasamy, Raghuveerasamy2018-11-222018-11-222007b2355226http://hdl.handle.net/1885/150982x, 62 leavesen-AUAuthor retains copyrightTK7871.15.S55L35 2007SiliconIon implantationStrength of materialsYield strength of ion implanted Si200710.25911/5d5e75139338d2018-11-21