Mangalampalli, S.R.N. KiranKrishna, GhanashyamPadmanabhan, K.A.2015-12-100038-1098http://hdl.handle.net/1885/66676Titanium nitride films of a thickness of ∼1.5 μm were deposited on amorphous and crystalline substrates by DC reactive magnetron sputtering at ambient temperature with 100% nitrogen in the sputter gas. The growth of nanostructured, i.e. crystalline nanKeywords: A. Thin films; Ambient temperatures; Amorphous substrate; Chemical compositions; Crystalline substrates; D. Mechanical properties; D. Optical properties; DC reactive magnetron sputtering; Different substrates; Lanthanum aluminate; Lower hardness; Modulus A. Thin films; D. Mechanical properties; D. Optical properties201110.1016/j.ssc.2011.01.0092016-02-24