Charles, C.Boswell, R. W.Lieberman, M. A.2015-09-112015-09-111070-664Xhttp://hdl.handle.net/1885/15351A radio frequency (rf) plasma is created at low pressure (∼1 mTorr) in the source tube of a “helicon” excited diffusion system in the absence of a dc magnetic field. The coupling is capacitive for the low source power of 160 W at 13.56 MHz considered here. Temperature measurements of the glass source tube yield a plasma power deposition of ∼35 W. The plasma parameters (density, potential, electron temperature) were measured using a retarding field energy analyzer. An analytical model based on the measuredplasma parameters and on additional external parameters measured in the matching box (rf voltages and phase, rf current) is developed. The model takes into account the geometry of the double saddle rf antenna. It is found that the inside of the glass wall adjacent to the antenna wire charges negatively. Ion acceleration into the glass along the antenna and fast electrons escaping the plasma account for most of the power deposition to the walls (∼16.8 W). Secondary electrons liberated by ions impinging onto the glass along the antenna contribute a power of ∼4.6 W. Adding the power of 3.7 W deposited to the part of the tube not affected by the antenna, the total power deposition responsible for the temperature rise of the tube is found to be about 25 W. The model shows that the power deposition is strongly nonuniform along the tube as a result of the antenna geometry. An estimate of the power deposited into the electrons by stochastic heating yields ∼1.4 W, compared to an estimate of 5.8 W for the measured power loss from electrons.© 2003 American Institute of Physics. http://www.sherpa.ac.uk/romeo/issn/1070-664X/..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 11/09/15).2003-02-1910.1063/1.1555058