Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films

Nandi, SanjoyLlewellyn, DavidBelay, KidaneVenkatachalam, DineshLiu, XinjunElliman, Robert2015-12-101431-9276http://hdl.handle.net/1885/61759Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films201410.1017/S14319276140116592015-12-10