Plasma Ionization in Low-Pressure Radio-Frequency Discharges-Part II: Particle-in-Cell Simulation

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Meige, A
O'Connell, D
Gans, T
Boswell, Roderick

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Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

Plasma ionization in the low-pressure operation regime (< 5 Pa) of RF capacitively coupled plasmas (CCPs) is governed by a complex interplay of various mechanisms, such as field reversal, sheath expansion, and wave-particle interactions. In a previous paper, it was shown that experimental observations in a hydrogen CCP operated at 13.56 MHz are qualitatively well described in a 1-D symmetrical particle-in-cell (PIC) simulation. In this paper, a spherical asymmetrical PIC simulation that is closer to the conditions of the highly asymmetrical experimental device is used to simulate a low-pressure neon CCP operated at 2 MHz. The results show a similar behavior, with pronounced ionization through field reversal, sheath expansion, and wave-particle interactions, and can be exploited for more accurate quantitative comparisons with experimental observations.

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IEEE Transactions on Plasma Science

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