Plasma Ionization in Low-Pressure Radio-Frequency Discharges-Part II: Particle-in-Cell Simulation
Date
2008
Authors
Meige, A
O'Connell, D
Gans, T
Boswell, Roderick
Journal Title
Journal ISSN
Volume Title
Publisher
Institute of Electrical and Electronics Engineers (IEEE Inc)
Abstract
Plasma ionization in the low-pressure operation regime (< 5 Pa) of RF capacitively coupled plasmas (CCPs) is governed by a complex interplay of various mechanisms, such as field reversal, sheath expansion, and wave-particle interactions. In a previous paper, it was shown that experimental observations in a hydrogen CCP operated at 13.56 MHz are qualitatively well described in a 1-D symmetrical particle-in-cell (PIC) simulation. In this paper, a spherical asymmetrical PIC simulation that is closer to the conditions of the highly asymmetrical experimental device is used to simulate a low-pressure neon CCP operated at 2 MHz. The results show a similar behavior, with pronounced ionization through field reversal, sheath expansion, and wave-particle interactions, and can be exploited for more accurate quantitative comparisons with experimental observations.
Description
Keywords
Keywords: Chlorine compounds; Excitons; Flow interactions; Hydrogen; Inductively coupled plasma; Inert gases; Ion beams; Ionization; Neon; Nonmetals; Particle beam dynamics; Particle interactions; Plasmas; Signal interference; Wave plasma interactions; Biological s Biological system modeling; Capacitively coupled plasma (CCP); Discharges; Electrodes; Field reversal; Heating; Integrated circuit modeling; Ionization; particle-in-cell (PIC) simulation; Plasmas; Radio frequency; RF; Wave particle interaction
Citation
Collections
Source
IEEE Transactions on Plasma Science
Type
Journal article