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Structure and mechanical properties of TiC films deposited using combination of pulsed DC and normal DC magnetron co-sputtering

Date

Authors

Thulasi Raman, K.H.

Mangalampalli, S.R.N. Kiran

Ramamurty, U

Rao, G. Mohan

Publisher

Elsevier

Abstract

Titanium-carbon (TiC) thin films of different compositions were prepared by a combination of pulsed DC (for Ti target) and normal DC (for graphite target) magnetron co-sputtering on oxidized silicon and fused quartz substrates. At 33.7 at.% of C content,

Keywords

Keywords: A-coefficient; Amorphous carbon matrix; Carbon content; Columnar grain; Cross-sectional scanning; DC magnetron co-sputtering; Deformation parameter; Fused quartz; Graphite target; Low carbon; Magnetron co-sputtering; Nanoscratch test; Oxidized silicon; Pr Nanocomposite; Nanoindentation; Preferred orientation; Pulsed balanced magnetron; Titanium carbide

URI

http://hdl.handle.net/1885/66527

Collections

ANU Research Publications

Source

Applied Surface Science

Type

Journal article

DOI

10.1016/j.apsusc.2012.05.064

Restricted until

2037-12-31

Downloads

File

Description

01_Thulasi Raman_Structure_and_mechanical_2012.pdf (1.98 MB)

02_Thulasi Raman_Structure_and_mechanical_2012.pdf (2.01 MB)