Cultural advice

The Australian National University acknowledges, celebrates and pays our respects to the Ngunnawal and Ngambri people of the Canberra region and to all First Nations Australians on whose traditional lands we meet and work, and whose cultures are among the oldest continuing cultures in human history.

Aboriginal and Torres Strait Islander peoples are advised that ANU Library collections may include images, names, voices, and other representations of deceased persons.

Material in the collection may contain terms, language or views that reflect the period in which the item was created and may be considered inappropriate today.

Wafer surface charge reversal as a method of simplifying nanosphere lithography for RIE texturing of solar cells

Thumbnail Image

Date

2007

Authors

Inns, Daniel
Campbell, Patrick
Catchpole, Kylie

Journal Title

Journal ISSN

Volume Title

Publisher

Hindawi Publishing Corporation

Abstract

A simplified nanosphere lithography process has been developed which allows fast and low-waste maskings of Si surfaces for subsequent reactive ion etching (RIE) texturing. Initially, a positive surface charge is applied to a wafer surface by dipping in a

Description

Keywords

Citation

URI

http://hdl.handle.net/1885/59068

Collections

ANU Research Publications

Source

Advances in OptoElectronics

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1155/2007/32707

Restricted until

2037-12-31

Downloads

File
Description
01_Inns_Wafer_surface_charge_reversal_2007.pdf (941.84 KB)

DSpace software copyright © 2002-2026 LYRASIS