Effect of substrate on hydrogen in and out diffusion from a-Si : H thin films

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dc.contributor.authorRao, Rui
dc.contributor.authorKail, F
dc.contributor.authorRoca i Cabarrocas, P
dc.date.accessioned2015-12-10T22:44:07Z
dc.date.issued2007
dc.date.updated2015-12-09T11:20:01Z
dc.description.abstractWe present a detailed study on the effect of the substrate on the structure and hydrogen evolution from p-type hydrogenated amorphous silicon thin films co-deposited on the grounded and RF electrodes of an asymmetric radio frequency glow discharge reactor, as well as the similar films exposed to an hydrogen plasma. We used spectroscopic ellipsometry and hydrogen evolution measurements to analyze the effects of the substrate, ion energy and hydrogen plasma on the films microstructure, thickness, hydrogen content, hydrogen binding and hydrogen evolution. The hydrogen evolution spectra show a strong substrate dependence. In particular on crystalline silicon substrate, we observe the formation of bubbles. For the various substrates, ion energy and hydrogen plasma treatment do not affect the hydrogen evolution spectra. These results indicate that the action of hydrogen in a-Si:H is modified by the nature of the substrate.
dc.identifier.issn0957-4522
dc.identifier.urihttp://hdl.handle.net/1885/58465
dc.publisherSpringer
dc.sourceJournal of Materials Science: Materials in Electronics
dc.subjectKeywords: Hydrogen evolution measurement; Hydrogen plasma; Radio frequency glow discharge reactor; Crystal microstructure; Crystalline materials; Diffusion; Hydrogen; Substrates; Thin films; Amorphous silicon
dc.titleEffect of substrate on hydrogen in and out diffusion from a-Si : H thin films
dc.typeJournal article
local.bibliographicCitation.issue10
local.bibliographicCitation.lastpage1056
local.bibliographicCitation.startpage1051
local.contributor.affiliationRao, Rui, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationKail, F, Laboratoires de Physique des Interfaces et des Couches Minces
local.contributor.affiliationRoca i Cabarrocas, P, Laboratoires de Physique des Interfaces et des Couches Minces
local.contributor.authoremailrepository.admin@anu.edu.au
local.contributor.authoruidRao, Rui, u4259836
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.identifier.absfor090699 - Electrical and Electronic Engineering not elsewhere classified
local.identifier.ariespublicationu4167262xPUB443
local.identifier.citationvolume18
local.identifier.doi10.1007/s10854-007-9123-x
local.identifier.scopusID2-s2.0-34547608205
local.identifier.uidSubmittedByu4167262
local.type.statusPublished Version

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