Direct measurement of absorption-induced wavefront distortion in high optical power systems
Date
2009-01-10
Authors
Brooks, Aidan F.
Hosken, David
Munch, Jesper
Veitch, Peter J.
Yan, Zewu
Zhao, Chunnong
Fan, Yaohui
Ju, Li
Blair, David
Willems, Phil
Journal Title
Journal ISSN
Volume Title
Publisher
Optical Society of America
Abstract
Wavefront distortion due to absorption in the substrates and coatings of mirrors in advanced gravitational
wave interferometers has the potential to compromise the operation and sensitivity of these interferometers.
We report the first direct spatially-resolved measurement,
to our knowledge, of such wavefront distortion in a high optical power cavity. The measurement was made
using an ultrahigh sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity of
the sensor was λ=730, where λ ¼ 800 nm.
Description
Keywords
wavefront, distortion, absorption, substrate, mirror, interferometer, optical, power, cavity, Hartmann
Citation
Collections
Source
Applied Optics
Type
Journal article
Book Title
Entity type
Access Statement
Open Access