Low energy O 2 + and N 2 + beam-induced profile broadening effects in Si

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dc.contributor.authorDeenapanray, Prakash
dc.contributor.authorPetravic, Mladen
dc.date.accessioned2015-12-10T23:30:42Z
dc.date.available2015-12-10T23:30:42Z
dc.date.issued2001
dc.date.updated2015-12-10T11:09:06Z
dc.identifier.issn0734-2101
dc.identifier.urihttp://hdl.handle.net/1885/68298
dc.publisherAmerican Institute of Physics (AIP)
dc.sourceJournal of Vacuum Science and Technology A
dc.titleLow energy O 2 + and N 2 + beam-induced profile broadening effects in Si
dc.typeJournal article
local.bibliographicCitation.issue3
local.bibliographicCitation.lastpage898
local.bibliographicCitation.startpage893
local.contributor.affiliationDeenapanray, Prakash, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationPetravic, Mladen, College of Physical and Mathematical Sciences, ANU
local.contributor.authoremailrepository.admin@anu.edu.au
local.contributor.authoruidDeenapanray, Prakash, u4018937
local.contributor.authoruidPetravic, Mladen, u8905251
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationMigratedxPub1674
local.identifier.citationvolume19
local.identifier.uidSubmittedByMigrated
local.type.statusPublished Version

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