Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films

Date

2014

Authors

Nandi, Sanjoy
Llewellyn, David
Belay, Kidane
Venkatachalam, Dinesh
Liu, Xinjun
Elliman, Robert

Journal Title

Journal ISSN

Volume Title

Publisher

Cambridge University Press

Abstract

Description

Keywords

Citation

Source

Microscopy and Microanalysis

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

Restricted until

2037-12-31