Thermal stability of silicon surface passivation by APCVD Al 2 O 3
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Black, Lachlan
Allen, Thomas
Cuevas, Andres
McIntosh, Keith
Veith, Boris
Schmidt, Jan
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Elsevier
Abstract
We investigate the thermal stability of silicon surface passivation provided by aluminium oxide (Al2O3) films deposited using atmospheric pressure chemical vapour deposition (APCVD) and fired in a belt furnace at a peak temperature of ~810 C. Firing stabi
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Solar Energy Materials and Solar Cells
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Restricted until
2037-12-31