Growth of Highly Ordered Thin Silicate Films at the Air-Water Interface

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dc.contributor.authorBrown, A S
dc.contributor.authorHolt, Stephen
dc.contributor.authorReynolds, Philip
dc.contributor.authorPenfold, J
dc.contributor.authorWhite, John
dc.date.accessioned2015-12-13T23:05:06Z
dc.date.issued1998
dc.date.updated2015-12-12T07:58:51Z
dc.description.abstractThe growth of thin silicate-organic films at the air-water interface of surfactant solutions has been studied in situ by X-ray and neutron reflectivity to a resolution of ca. 5 Å. Surfactant in the solution and the air-water interface itself are involved
dc.identifier.issn0743-7463
dc.identifier.urihttp://hdl.handle.net/1885/85381
dc.publisherAmerican Chemical Society
dc.sourceLangmuir
dc.titleGrowth of Highly Ordered Thin Silicate Films at the Air-Water Interface
dc.typeJournal article
local.bibliographicCitation.issue14
local.bibliographicCitation.lastpage5538
local.bibliographicCitation.startpage5532
local.contributor.affiliationBrown, A S, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationHolt, Stephen, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationReynolds, Philip, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationPenfold, J, Regenera Ltd
local.contributor.affiliationWhite, John, College of Physical and Mathematical Sciences, ANU
local.contributor.authoremailu8506305@anu.edu.au
local.contributor.authoruidBrown, A S, u950430
local.contributor.authoruidHolt, Stephen, u9708710
local.contributor.authoruidReynolds, Philip, u9400730
local.contributor.authoruidWhite, John, u8506305
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor030206 - Solid State Chemistry
local.identifier.ariespublicationMigratedxPub13749
local.identifier.citationvolume19
local.identifier.scopusID2-s2.0-0032166458
local.identifier.uidSubmittedByMigrated
local.type.statusPublished Version

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