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Pulsed chemical vapor deposition of Cu2S into a porous TiO 2 matrix

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Date

2011

Authors

Carbone, I.
Zhou, Q.
Vollbrecht, B.
Yang, L.
Medling, Scott
Bezryadina, A.
Bridges, F.
Alers, G.B.
Norman, J.T.
Kinmen, T.

Journal Title

Journal ISSN

Volume Title

Publisher

American Institute of Physics (AIP)

Abstract

Chalcocite (Cu2S) has been deposited via pulsed chemical vapor deposition (PCVD) into a porous TiO2 matrix using hydrogen sulfide and a metal-organic precursor. The precursor used is similar to the more common Cu(hfac)(tmvs) precursor, but it is fluorine

Description

Keywords

Keywords: Alternating cycle; Copper precursors; Direct band gap; EXAFS; Extended X-ray absorption fine structure measurements; Fluorine-free; Gas-phase reactions; Gasphase; matrix; Mesoporous TiO; Metal organic precursors; Optical absorption measurement; Phototherm

Citation

URI

http://hdl.handle.net/1885/65155

Collections

ANU Research Publications

Source

Journal of Vacuum Science and Technology A

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1116/1.3609772

Restricted until

2037-12-31

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01_Carbone_Pulsed_chemical_vapor_2011.pdf (991.13 KB)

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