Formation of plasma induced surface damage in silica glass etching for optical waveguides
Ge, B, P-doped silicaglass films are widely used as optical waveguides because of their low losses and inherent compatibility with silica optical fibers. These films were etched by ICP(inductively coupled plasma) with chrome etch masks, which were patterned by reactive ion etching (RIE) using chlorine-based gases. In some cases, the etched surfaces of silicaglass were very rough (root-mean square roughness greater than 100 nm) and we call this phenomenon plasma induced surface damage (PISD)....[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Applied Physics|
|01_Choi_Formation_of_plasma_induced_2004.pdf||Published Version||352.74 kB||Adobe PDF|
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