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High index contrast polysiloxane waveguides fabricated by dry etching

Madden, S. J.; Zhang, M. Y.; Choi, D.-Y.; Luther-Davies, B.; Charters, R.


The authors demonstrate the production of low loss enhanced index contrast waveguides by reactive ion etching of IPG™ polysiloxane thin films. The use of a silica mask and CHF₃∕O₂etch gas led to large etch selectivity between the silica and IPG™ of >20 and etch rates of >100nm∕min. This work indicates that compact optical circuits could be successfully fabricated for telecommunication applications using polysiloxane films.

CollectionsANU Research Publications
Date published: 2009-04-28
Type: Journal article
Source: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI: 10.1116/1.3119670


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