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Distributions of self-trapped hole continuums in silica glass

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Wang, R. P.; Saito, K.; Ikushima, A. J.

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Photobleaching of self-trapped holes (STH) in low temperature UV-irradiated silica glass has been investigated by the electron spin resonance method. The bleaching time dependence of the decay of two kinds of STH, STH1, and STH2, could be well fitted by the stretched exponential function, and STH2 has a quicker decay than STH1. On the other hand, the decay becomes significant large when the photon energy increases from 1.5to2.0eV, and then keeps constant with a further increase of photon...[Show more]

dc.contributor.authorWang, R. P.
dc.contributor.authorSaito, K.
dc.contributor.authorIkushima, A. J.
dc.date.accessioned2015-12-18T03:31:06Z
dc.date.available2015-12-18T03:31:06Z
dc.identifier.issn0021-8979
dc.identifier.urihttp://hdl.handle.net/1885/95109
dc.description.abstractPhotobleaching of self-trapped holes (STH) in low temperature UV-irradiated silica glass has been investigated by the electron spin resonance method. The bleaching time dependence of the decay of two kinds of STH, STH1, and STH2, could be well fitted by the stretched exponential function, and STH2 has a quicker decay than STH1. On the other hand, the decay becomes significant large when the photon energy increases from 1.5to2.0eV, and then keeps constant with a further increase of photon energy. The distributions of the STH continuums are estimated at the positions on top of the valence band, being 1.66±0.27eV for STH1 and 1.63±0.33eV for STH2. A possible recombination mechanism is proposed to explain the decay of STH signals.
dc.publisherAmerican Institute of Physics (AIP)
dc.rightshttp://www.sherpa.ac.uk/romeo/issn/0021-8979..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 18/12/15). Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics and may be found at https://doi.org/10.1063/1.2216350
dc.sourceJournal of Applied Physics
dc.subjectKeywords: Functions; Fused silica; Hole traps; Paramagnetic resonance; Photons; Exponential function; Photobleaching; Photon energy; Self-trapped holes (STH); Electron traps
dc.titleDistributions of self-trapped hole continuums in silica glass
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume100
dc.date.issued2006-07-13
local.identifier.absfor091206
local.identifier.absfor020499
local.identifier.ariespublicationu9912193xPUB13
local.publisher.urlhttps://www.aip.org/
local.type.statusPublished Version
local.contributor.affiliationWang, Rongping, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Laser Physics Centre, The Australian National University
local.contributor.affiliationSaito, K, Toyota Technological Institute, Japan
local.contributor.affiliationIkushima, A J, Toyota Technological Institute, Japan
local.bibliographicCitation.issue1
local.bibliographicCitation.startpage013706
local.identifier.doi10.1063/1.2216350
dc.date.updated2016-02-24T12:14:26Z
local.identifier.scopusID2-s2.0-33746191684
CollectionsANU Research Publications

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