Skip navigation
Skip navigation

Hydrogen Interaction with Implantation Induced Point Defects in p-type Silicon

Fatima, S; Jagadish, Chennupati; Lalita, J; Svensson, B; Hallen, A


Interaction of hydrogen with implantation induced point defects in p-type Si has been monitored using deep level transient spectroscopy. H ions are implanted into p-Si using low doses in the range from 109 to 1010 cm-2. Vacancy and interstitial related defects are observed. Besides irradiation induced defects with levels at Ev + 0.19 and Ev + 0.35 eV, two additional defect levels at 0.28 and 0.51 eV above the valence band edge (Ev) are resolved. They are identified as hydrogen related after...[Show more]

CollectionsANU Research Publications
Date published: 1999
Type: Journal article
Source: Journal of Applied Physics


File Description SizeFormat Image
01_Fatima_Hydrogen_Interaction_with_1999.pdf447.66 kBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  20 July 2017/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator