Refractive indices and thickness of optical waveguides fabricated by Si ion implantation into silica glass
Planar optical waveguides formed by Si ion implantation into PECVD SiO2 have been characterized by the dark mode spectroscopy method at a wavelength of 0.6328 μm. The measured effective index values of the guided modes have been used to investigate the o
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|Source:||Thin Solid Films|
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