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Fragmentation of dodecanethiol molecules: application to self-assembled monolayer damage in atom lithography

Close, John; Hoffman, K; Quaas, N; Baldwin, Kenneth


Atom lithography commonly employs self-assembled monolayers (SAMs) of alkanethiols which act as resists to protect prepared surfaces. Metastable atomic species such as helium are used to damage the resist, enabling pattern transfer via mask lithography, followed by wet chemical etching. The damage mechanism is, however, not well understood. Here we report studies of fragmentation of dodecanethiol (DDT) molecules embedded in helium nanodroplets that have been irradiated by an electron beam. The...[Show more]

CollectionsANU Research Publications
Date published: 2000
Type: Journal article
Source: Applied Physics B: Lasers and Optics


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