Close, John; Baldwin, Kenneth; Hoffman, K; Quaas, N
Atom lithography commonly employs self-assembled monolayers (SAMs) of alkanethiols which act as resists to protect prepared surfaces. Metastable atomic species such as helium are used to damage the resist, enabling pattern transfer via mask lithography, followed by wet chemical etching. The damage mechanism is, however, not well understood. Here we report studies of fragmentation of dodecanethiol (DDT) molecules embedded in helium nanodroplets that have been irradiated by an electron beam. The...[Show more]
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