Electrical characterization of a dc secondary discharge created during plasma sputtering deposition of palladium thin films
Good quality Pd thin films (for catalysis application) can be obtained by a low-pressure plasma sputtering method. The metal atom source is a helicoidal wire which is negatively biased so that argon ions created in a high frequency plasma are attracted and gain sufficient energy to induce sputtering. Depending on the experimental conditions (gas pressure, wire bias voltage), the sputtering process occurs in different regimes corresponding to either the presence of a simple cathodic sheath or...[Show more]
|Collections||ANU Research Publications|
|Source:||Plasma Sources Science and Technology|
Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.