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Heavy-ion elastic-recoil detection ananlysis of doped-silica films for integrated photonics

Dall (previously Weijers), Tessica; Gaff, K; Timmers, Heiko; Ophel, T; Elliman, Robert

Description

Photosensitive Ge- and Sn-doped silica films are being developed for integrated photonics applications. Such films can be deposited by plasma assisted deposition techniques and their initial refractive index and photosensitivity are determined by the Ge(Sn):Si:O stoichiometry. The presence of H in the films is detrimental to their performance because it causes optical absorption in the 1.3-1.5 μm wavelength range of interest for telecommunications. Characterization of the films therefore...[Show more]

dc.contributor.authorDall (previously Weijers), Tessica
dc.contributor.authorGaff, K
dc.contributor.authorTimmers, Heiko
dc.contributor.authorOphel, T
dc.contributor.authorElliman, Robert
dc.date.accessioned2015-12-13T23:17:53Z
dc.identifier.issn0168-583X
dc.identifier.urihttp://hdl.handle.net/1885/89912
dc.description.abstractPhotosensitive Ge- and Sn-doped silica films are being developed for integrated photonics applications. Such films can be deposited by plasma assisted deposition techniques and their initial refractive index and photosensitivity are determined by the Ge(Sn):Si:O stoichiometry. The presence of H in the films is detrimental to their performance because it causes optical absorption in the 1.3-1.5 μm wavelength range of interest for telecommunications. Characterization of the films therefore requires accurate determination of the film composition, including the presence of H. Heavy-ion elastic-recoil detection (ERD) is shown to provide such information in a single measurement.
dc.publisherElsevier
dc.sourceNuclear Instruments and Methods in Physics Research: Section B
dc.subjectKeywords: Chemical analysis; Composition effects; Germanium; Heavy ions; Hydrogen; Integrated optoelectronics; Ion beams; Optical films; Photosensitivity; Refractive index; Thin films; Tin; Heavy ion elastic recoil detection analysis; Ion beam analysis; Silica
dc.titleHeavy-ion elastic-recoil detection ananlysis of doped-silica films for integrated photonics
dc.typeJournal article
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.citationvolume161
dc.date.issued2000
local.identifier.absfor100507 - Optical Networks and Systems
local.identifier.ariespublicationMigratedxPub20148
local.type.statusPublished Version
local.contributor.affiliationDall (previously Weijers), Tessica, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationGaff, K, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationTimmers, Heiko, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationOphel, T, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationElliman, Robert, College of Physical and Mathematical Sciences, ANU
local.description.embargo2037-12-31
local.bibliographicCitation.startpage624
local.bibliographicCitation.lastpage628
local.identifier.doi10.1016/S0168-583X(99)00850-2
dc.date.updated2015-12-12T08:54:47Z
local.identifier.scopusID2-s2.0-0033892617
CollectionsANU Research Publications

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