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Plasma Synthesis of Catalytic Thin Films

Thomann, A; Rozenbaum, J; Brault, Pascal; Andreazza, C; Andreazza, P; Rousseau, M; Estrade-Szwarckopf, H; Berthet, A; Bertolini, J; Cadete Santos Aires, F; Monnet, F; Mirodatos, C; Charles, Christine; Boswell, Roderick


Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

CollectionsANU Research Publications
Date published: 2002
Type: Journal article
Source: Pure and Applied Chemistry


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