Skip navigation
Skip navigation

Plasma Synthesis of Catalytic Thin Films

Thomann, A; Rozenbaum, J; Brault, Pascal; Andreazza, C; Andreazza, P; Rousseau, M; Estrade-Szwarckopf, H; Berthet, A; Bertolini, J; Cadete Santos Aires, F; Monnet, F; Mirodatos, C; Charles, Christine; Boswell, Roderick

Description

Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

CollectionsANU Research Publications
Date published: 2002
Type: Journal article
URI: http://hdl.handle.net/1885/89695
Source: Pure and Applied Chemistry

Download

There are no files associated with this item.


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  20 July 2017/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator