Plasma Synthesis of Catalytic Thin Films
Thomann, A; Rozenbaum, J; Brault, Pascal; Andreazza, C; Andreazza, P; Rousseau, M; Estrade-Szwarckopf, H; Berthet, A; Bertolini, J; Cadete Santos Aires, F; Monnet, F; Mirodatos, C; Charles, Christine; Boswell, Roderick
Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.
|Collections||ANU Research Publications|
|Source:||Pure and Applied Chemistry|