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Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

Canning, J; Aslund, Mathias; Ankiewicz, Adrian; Dainese, M; Fernando, R; Sahu, J; Wosinski, L

Description

Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.

CollectionsANU Research Publications
Date published: 2000
Type: Journal article
URI: http://hdl.handle.net/1885/89257
Source: Applied Optics

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