Wall Effects on the Chemistry in a Pulsed Oxygen/Silane Radiofrequency Helicon Plasma
A pulsed oxygen/silane radiofrequency (13.56 MHz) plasma is created in a helicon diffusion reactor used for silicon dioxide deposition. An energy selective mass spectrometer is used to measure the time-averaged ion energy distribution function of the four predominant positive ions (H3+, H3O+, SiH3+, and SiOH+) and the positive ion mass spectra during the breakdown phase and the steady-state phase of the pulse. Charging of the silica-covered chamber wall by ∼55 V is observed both for continuous...[Show more]
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|Source:||Journal of Physics D: Applied Physics|
|01_Charles_Wall_Effects_on_the_Chemistry_2003.pdf||184.64 kB||Adobe PDF||Request a copy|
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