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An X-ray reflectivity study of evaporation-induced self-assembled titania-based films

Henderson, Mark; Gibaud, Alain; Bardeau, Jean-Francois; White, John

Description

X-Ray reflectivity was used to monitor the structural development of a titania-based film at the solid/air interface by evaporation-induced self-assembly (EISA). A nonionic poly(ethylene oxide)-based surfactant, Brij 58, was used as the template and titanium chloride as the inorganic precursor. The reflectivity pattern, film thickness and refractive index were shown to be dependent on film deposition method, whether by casting or by dip-coating onto a silicon wafer, the Brij 58 TiO2 ratio and...[Show more]

dc.contributor.authorHenderson, Mark
dc.contributor.authorGibaud, Alain
dc.contributor.authorBardeau, Jean-Francois
dc.contributor.authorWhite, John
dc.date.accessioned2015-12-13T23:05:08Z
dc.identifier.issn0959-9428
dc.identifier.urihttp://hdl.handle.net/1885/85391
dc.description.abstractX-Ray reflectivity was used to monitor the structural development of a titania-based film at the solid/air interface by evaporation-induced self-assembly (EISA). A nonionic poly(ethylene oxide)-based surfactant, Brij 58, was used as the template and titanium chloride as the inorganic precursor. The reflectivity pattern, film thickness and refractive index were shown to be dependent on film deposition method, whether by casting or by dip-coating onto a silicon wafer, the Brij 58 TiO2 ratio and the relative humidity. At Brij 58 contents of 40 wt%, the reflectivity profile displayed only a single diffraction peak. At 70 wt% Bragg diffraction indicated a lamellar ordering of film components. Modelled reflectivity data suggested a 1060 Å thick film that comprised 17 layers of alternating surfactant and titania with a d spacing of about 60 Å. The effect of relative humidity on film structure was explored.
dc.publisherRoyal Society of Chemistry
dc.sourceJournal of Materials Chemistry
dc.subjectKeywords: Atmospheric humidity; Evaporation; Interfaces (materials); Silicon wafers; Surface active agents; Film structure; Structural development; Titania-based films; X-ray reflectivity; Titanium compounds
dc.titleAn X-ray reflectivity study of evaporation-induced self-assembled titania-based films
dc.typeJournal article
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.citationvolume16
dc.date.issued2006
local.identifier.absfor030601 - Catalysis and Mechanisms of Reactions
local.identifier.ariespublicationMigratedxPub13766
local.type.statusPublished Version
local.contributor.affiliationHenderson, Mark, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationGibaud, Alain, Universite du Maine
local.contributor.affiliationBardeau, Jean-Francois, Universite du Maine
local.contributor.affiliationWhite, John, College of Physical and Mathematical Sciences, ANU
local.description.embargo2037-12-31
local.bibliographicCitation.issue25
local.bibliographicCitation.startpage2478
local.bibliographicCitation.lastpage2484
local.identifier.doi10.1039/b601677d
dc.date.updated2015-12-12T07:58:58Z
local.identifier.scopusID2-s2.0-33745191411
CollectionsANU Research Publications

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