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Ultraviolet lasing with low excitation intensity in deep-level emission free ZnO films

Wang, Rongping; Muto, H; Gang, X; Jin, P; Tazawa, M

Description

We have prepared high-quality zinc oxide (ZnO) films by using laser ablation and magnetron sputtering. The deep-level emission free spectra have been obtained for ZnO films on both sapphire and fused silica. It was found that the stimulated emission and band-edge emission were sensitive to the quality of the ZnO films. Strong band-edge emission can be achieved and the stimulated emission can be excited at low threshold excitation density of 7 W/cm 2 in single crystal ZnO films. By using special...[Show more]

CollectionsANU Research Publications
Date published: 2005
Type: Journal article
URI: http://hdl.handle.net/1885/85345
Source: Journal of Crystal Growth
DOI: 10.1016/j.jcrysgro.2005.05.019

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