Novel processing for Si-nanocrystal based photonic materials
We report a study of novel processing approaches for the formation of silicon nanocrystals for photonic devices. A silicon rich oxide was formed using ion implantation into thermally grown oxides on Silicon and transparent sapphire substrates. These layers were then treated with rapid thermal processing to observe the formation of silicon nanocrystals on a one second to ten minute timescale. Transmission electron microscopy and Raman scattering were used to follow the evolution of the...[Show more]
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