Skip navigation
Skip navigation

Correlating properties of PECVD SiNx layers to deposition parameters

Vora, Kaushal; Belay, Kidane; Pyke, Daniel; Karouta, Fouad; Jagadish, Chennupati


We present a comprehensive study of the properties of SiNx layers deposited by PECVD correlating refractive index, mechanical stress, deposition rate, N/Si ratio, H-incorporation as function of the deposition parameters such SiH4 flow, RF power, LF/HF powers ratio and deposition temperature.

CollectionsANU Research Publications
Date published: 2010
Type: Conference paper
Source: Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD
DOI: 10.1109/COMMAD.2010.5699737


File Description SizeFormat Image
01_Vora_Correlating_properties_of_2010.pdf691.45 kBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  20 July 2017/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator