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Photoluminescence band of Hf origin in hafnium-implanted silicon in the energy range 700 meV to 950 meV

Sachdeva, R; Istratov, A A; Deenapanray, Prakash; Weber, E R


A new photoluminescence (PL) band in the energy range of 700 to 950 meV associated with hafnium implanted in silicon is reported. A shift in the position of photoluminescence peaks observed on the samples implanted with two different isotopes of Hf confirms the Hf-related origin of the observed photoluminescence band. Activation of the Hf-optical centers requires a 1000°C anneal step. The intensity of the PL lines depends on the cooling conditions. The spectrum consists of 5 peaks in the...[Show more]

CollectionsANU Research Publications
Date published: 2005
Type: Journal article
Source: Physical Review B: Condensed Matter and Materials
DOI: 10.1103/PhysRevB.71.195208


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